12-Inch Compatible Large-Area Hot-Filament CVD System
– Two-stage automatic recipe operation (Seeding → Film Growth)
– Equipped with automatic filament tension adjustment mechanism
– Shortened tension stabilization time: Approximately 5 minutes (during the carbonization process)
– Capable of long-term unattended operation
– Equipped with various interlocks (water flow, gas pressure)
– Full-chamber water-cooling system
– Suitable for both R&D and mass production
- Diamond Thin Films
– Chemical stability, high thermal conductivity, excellent semiconductor properties - Applications
– Electrochemical electrodes, heat dissipation substrates, contact layers for radiation-resistant devices, etc.
